Rolf Claessen    Premium-Mitglied   Gruppenmoderator

In erster Linie bin ich Patentanwalt / Patent Attorney und Markenanwalt. Ich arbeite Schutzrechtsanmeldungen aus (Patentanmeldung, Markenanmeldung, Gebrauchsmusteranmeldung, Geschmacksmusteranmeldung) und setze die resultierenden Schutzrechte (Patent, Marke, Gebrauchsmuster, Geschmacksmuster) durch. Vor allem interessieren mich die Gebiete Nanotechnologie, Oberflächenanalytik (RBS, AES, XPS, SEM, AFM, linearer Teilchenbeschleuniger, Rasterelektronenmikroskop), Oberflächentechnik, Werkstoffe, Materialwissenschaften, Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD), Halbleiterfertigungsprozesse. Folgend einige Projekte und Veröffentlichungen, die auf mich zurückgehen:

http://www.ipnewsflash.com (Hobby als Patentanwalt)

http://www.ipkosten.de

openbc@claessen.net


Veröffentlichungen:



Books

"Understanding Key Molecular Properties in a CVD Process Feasibility Study", Januar 2001, ISBN: 3831142742


Press & Magazines

• R. Claessen „Coatings for architectural glass“ Glass 2002, vol79 no5 p171

• R. Claessen et al. „Durable coatings" Glass International, Sept./Oct. 2002.

• R. Claessen „Reinigungsfreie Oberflächen in optischer Qualität werden Realität" Journal für Oberflächentechnik, Nov. 2002.

• R. Claessen “No more dirty looks" Asia Pacific Coatings Journal, Dec. 2002.

• R. Claessen "Recent advances in hydrophobic and hydrophilic glass coatings" International Glass Review, April 2003.


Patents

• J. T. Welch, R. Claessen, and S. Ngo “Metal triflimide complexes“ U.S. patent US5986120, Nov. 16, 1999. (equiv. WO9940124A1, EP1053259A1)

• J.T. Welch, P.J. Toscano, A. Kornilov, R. Claessen, K. Banger and A. Kaloyeros “MOCVD processes using precursors based on
organometalloid ligands“ U.S. patent US6099903, Aug. 8, 2000. (equiv. WO070119A1)

• J.T. Welch, P.J. Toscano, A. Kornilov, R. Claessen, K. Banger and A. Kaloyeros “MOCVD precursors based on organometalloid ligands“ US patent US6184403, Feb. 6, 2001. (equiv. WO069863A1)


Papers

• R.U. Claessen “Trends in Interactive Chemistry” Chemical Web Marketing & Technology 1997, 1, 5.

• R.U Claessen, J.T. Welch, P.J. Toscano, K.K. Banger, A.M. Kornilov, E.T. Eisenbraun, A. E. Kaloyeros “The 2,2,6,6-tetramethyl-2-sila-3,5-heptanedione route to the chemical vapor deposition of copper for gigascale interconnect applications.” Mater. Res. Soc., Symp. Proc. 2000, 612, D6.8.1 - D6.8.6.

• K.K. Banger, A. Kornilov, R. U. Claessen, E.T. Eisenbraun, A. Kaloyeros, P.J. Toscano, and J. T. Welch “The first metal complex containing a silylated β-diektonate ligand: bis(2,2,6,6-tetramethyl-2-sila-3,5-heptanedionato) copper(II)” Inorg. Chem. Comm. 2001, 4, 496 - 500.

• K.K. Banger, A.M. Kornilov, R.U. Claessen, C. Birringer, P.J. Toscano, J.T. Welch “A Facile Synthesis of 2,2,6,6-Tetramethyl-2-germa-3,5-heptandione: The Preparation and Characterization of the First Germa--diketonate Copper(II) Complex” Organometallics 2001, 20, 4745.

• R. Claessen, K. Reihs, P. Figueiredo, O.Stahlschmidt, A. Duparré "TOWARDS A TRUE "NO-CLEAN" PROPERTY: HIGHLY DURABLE ULTRA-HYDROPHOBIC COATINGS FOR OPTICAL APPLICATIONS" Proc. Europ. Coat. Conf. Smart Coatings 2002, 181.

• K.K. Banger, S.C. Ngo, S. Higashiya, R.U. Claessen, K.S. Bousman, P. Lim, P.J. Toscano, J.T. Welch “MOCVD precursor engineering: the preparation and characterization of sila-β-diketonate copper(II) complexes” Inorg. Chem. 2003, submitted.

• Banger K.K.; Ngo S.C.; Higashiya S.; Claessen R.U.; Bousman K.S.; Lim P.N.; Toscano P.J.; Welch J.T. "Facile synthesis of a novel class of organometalloid-containing ligands, the sila--diketones: preparation and physical and structural characterization of the copper(II) complexes, Cu[R'C(O)CHC(O)SiR3]2" Journal of Organometallic Chemistry, Volume 678, Number 1, 15 July 2003, pp. 15-32(18)

• K. Reihs, N. Malkomes, P. Müller, S. Renker, O. Stahlschmidt, R. Claessen, P. Cavaleiro, A. Duparré "Durable Ultra-Hydrophobic Glass Coatings With Optical Quality" Soc. Vac. Coat. Proc. 2003, 46, 302.

• Claessen R.U.; Kornilov A.M.; Banger K.K.; Ngo S.C.; Higashiya S.; Wells C.C.; Dikarev E.V.; Toscano P.J.; Welch J.T. "Investigations into the preparation of sila--diketones via 2-trimethylsilyl-1,3-dithianes: structural characterization of a second polymorph of bis(2,2,6,6-tetramethyl-2-sila-3,5-heptanedionato)copper(II) " Journal of Organometallic Chemistry, Volume 689, Number 1, 5 January 2004, pp. 71-81(11)


Conferences, Seminars

• Toscano, P. J.; Ngo, S. C.; Claessen, R.; Banger, K. K.; Welch, J. T. “Metal triflimide complexes for styrene polymerization“ 216th ACS National Meeting, Boston, August 23-27, 1998, INOR-082.

• T. Welch, S. C. Ngo, R. Claessen, K. K. Banger, and P. J. Toscano “Preparation and Structural Characterization of New Transition Metal Complexes Containing Triflate and Triflimide Ligands” 12th European Symposium on Fluorine Chemistry, Berlin, August 29 – September 2, 1998, C39.

• Toscano, Paul J.; Banger, Kulbinder K.; Kornilov, Andrei; Claessen, Rolf U.; Welch, John T.; Eisenbraun, Eric T.; Kaloyeros, Alain E. “Facile preparation and isolation of the sila- β -diketone, 2,2,6,6-tetramethyl-2-sila-3,5-heptanedione: The influence of silicon substitution on the volatility and chemical vapor Deposition properties of the Cu(II) complex.” 219th ACS National Meeting, San
Francisco, CA, March 26-30, 2000, INOR-261.

• Welch, John T.; Banger, Kulbinder K.; Ngo, Silvana C.; Claessen, Rolf U.; Toscano, Paul J.; Eisenbraun, Eric T.; Kaloyeros, Alain E. “Precursor engineering and characterization of new volatile copper MOCVD precursors for thin-film deposition“ 219th ACS National Meeting, San Francisco, CA, March 26-30, 2000, INOR-264.

• R.U Claessen et al. “The 2,2,6,6-tetramethyl-2-sila-3,5-heptanedione route to the chemical vapor deposition of copper for gigascale interconnect applications.” Mater. Res. Soc. Meeting, San Francisco, CA, April 24-28, 2000, D6.8. (presenting author)

• Invited Seminar: “Volatile Precursor Design for the Chemical Vapor Deposition of Metals”, Nov. 2000, Chemistry Dept. University at Albany – SUNY.

• R.U Claessen et al. “A new halogen-free organometallic family of precursors for CVD copper: design, characterization and process development” Applied Mechanics and Materials Summer Conference, ASME symposium, San Diego, CA, June 27-29, 2001. (presenting author)

• R. U. Claessen “TOWARDS A TRUE "NO-CLEAN" PROPERTY: HIGHLY DURABLE ULTRA-HYDROPHOBIC COATINGS FOR OPTICAL APPLICATIONS” European Coatings Conference - Smart Coatings, Berlin, 6.-7. June 2002.

• R. U. Claessen “Nanostructured and auto-regenerating hybrid inorganic/polymer coatings for a durable self-clean effect in optical quality” Mater. Res. Soc. Meeting, Boston, MA, Dec 2.-6. 2002, C6.2.

• R. Claessen “Durable Self Cleaning Coatings in Optical Quality” Glass Processing Days, Tampere, Finland, 15.-18. June 2003