Dr. Rolf Claessen

Dr. Rolf Claessen

Ph.D., USA, Chemie, Patentanwalt

Patentanwalt, Partner, European Patent and Trademark Attorney (Patentanwalt)

(The company name is only visible to registered members)

  • 50677 Köln
  • Germany

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Personal information

Professional experience

  • Employment status
    Freelancer

Educational background

  • May 2008 - May 2008
    JCI University

    JCI Presenter, Graduate

    Präsentation, Spontanvortrag

  • Sep 2007 - Sep 2007
    JCI University

    JCI Achieve, Graduate

    Mitgliedergewinnung, Mitgliedermotivation

  • Jun 2004 - Jun 2006
    Fernuniversität Hagen

    Rechtswissenschaften (für Patentanwalt), Teil der Zulassung zum Patentanwalt

    Patentrecht, Zivilrecht, Wettbewerbsrecht, Teil der Ausbildung zum Patentanwalt

  • Sep 2003 - Mar 2008
    European Patent Office

    European Patent Attorney, Europäischer Patentanwalt, European Qualifying Examination, Europäischer Patentanwalt

    European Patent Law, Europäischer Patentanwalt

  • Sep 1997 - Jan 2002
    State University of New York / AlbanyNanotech (Promotion)

    Chemie, Physik, Halbleiter, Nanotechnologie, Ph.D.

    Chemical Vapor Deposition, Oberflächenanalyse, TEM, SEM, RBS, AES, XPS

  • Apr 1996 - Sep 1997
    Universität Würzburg

    Chemie, -

    Biochemie

  • Oct 1993 - Apr 1996
    Universität Tübingen

    Chemie, Vordiplom

    anorganische Chemie, organische Chemie, physikalische Chemie, Physik, Mathematik

  • Languages
    German (First language), English (Fluent), French (Basic knowledge), Latein, Altgriechisch, PHP, MySQL, HTML, XML

About me

Patentanwälte Freischem

Salierring 47-53
D-50677 Köln
Telefon +49 (0) 221 / 270 577-0
Telefax +49 (0) 221 / 270 577-10

Ich bin deutscher und europäischer Patent- und Markenanwalt und Partner bei der international tätigen Patentanwaltskanzlei Freischem in Köln. Ich arbeite Schutzrechtsanmeldungen aus (Patentanmeldung, Markenanmeldung, Gebrauchsmusteranmeldung, Geschmacksmusteranmeldung) und setze die resultierenden Schutzrechte (Patent, Marke, Gebrauchsmuster, Geschmacksmuster) durch. Vor allem interessieren mich die Gebiete Chemie, Pharma, Nanotechnologie, Oberflächenanalytik (RBS, AES, XPS, SEM, AFM, linearer Teilchenbeschleuniger, Rasterelektronenmikroskop), Oberflächentechnik, Werkstoffe, Materialwissenschaften, Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD), Halbleiterfertigungsprozesse. Als Hobby betreue ich die Webseite http://www.ipnewsflash.com (Hobby als Patentanwalt)
 
Veröffentlichungen
  • Claessen  "Von Tomaten und Broccoli" IPRB 2011, 85-87 
  • Buchenau, Claessen "Europäische Teilanmeldungen" IPRB 2010, 133
  • Kühnen, Claessen "Praxisleitfaden Düsseldorfer Besichtigungspraxis" IPRB 2010, 83-87
  • ...
 

 

Books
 
"Understanding Key Molecular Properties in a CVD Process Feasibility Study", Januar 2001, ISBN: 3831142742
 

Press & Magazines
 
• R. Claessen „Coatings for architectural glass“ Glass 2002, vol79 no5 p171
 
• R. Claessen et al. „Durable coatings" Glass International, Sept./Oct. 2002.
 
• R. Claessen „Reinigungsfreie Oberflächen in optischer Qualität werden Realität" Journal für Oberflächentechnik, Nov. 2002.
 
• R. Claessen “No more dirty looks" Asia Pacific Coatings Journal, Dec. 2002.
 
• R. Claessen "Recent advances in hydrophobic and hydrophilic glass coatings" International Glass Review, April 2003.
 

Patents
 
• J. T. Welch, R. Claessen, and S. Ngo “Metal triflimide complexes“ U.S. patent US5986120, Nov. 16, 1999. (equiv. WO9940124A1, EP1053259A1)
 
• J.T. Welch, P.J. Toscano, A. Kornilov, R. Claessen, K. Banger and A. Kaloyeros “MOCVD processes using precursors based on
organometalloid ligands“ U.S. patent US6099903, Aug. 8, 2000. (equiv. WO070119A1)
 
• J.T. Welch, P.J. Toscano, A. Kornilov, R. Claessen, K. Banger and A. Kaloyeros “MOCVD precursors based on organometalloid ligands“ US patent US6184403, Feb. 6, 2001. (equiv. WO069863A1)
 

Papers
 
• R.U. Claessen “Trends in Interactive Chemistry” Chemical Web Marketing & Technology 1997, 1, 5.
 
• R.U Claessen, J.T. Welch, P.J. Toscano, K.K. Banger, A.M. Kornilov, E.T. Eisenbraun, A. E. Kaloyeros “The 2,2,6,6-tetramethyl-2-sila-3,5-heptanedione route to the chemical vapor deposition of copper for gigascale interconnect applications.” Mater. Res. Soc., Symp. Proc. 2000, 612, D6.8.1 - D6.8.6.
 
• K.K. Banger, A. Kornilov, R. U. Claessen, E.T. Eisenbraun, A. Kaloyeros, P.J. Toscano, and J. T. Welch “The first metal complex containing a silylated β-diektonate ligand: bis(2,2,6,6-tetramethyl-2-sila-3,5-heptanedionato) copper(II)” Inorg. Chem. Comm. 2001, 4, 496 - 500.
 
• K.K. Banger, A.M. Kornilov, R.U. Claessen, C. Birringer, P.J. Toscano, J.T. Welch “A Facile Synthesis of 2,2,6,6-Tetramethyl-2-germa-3,5-heptandione: The Preparation and Characterization of the First Germa--diketonate Copper(II) Complex” Organometallics 2001, 20, 4745.
 
• R. Claessen, K. Reihs, P. Figueiredo, O.Stahlschmidt, A. Duparré "TOWARDS A TRUE "NO-CLEAN" PROPERTY: HIGHLY DURABLE ULTRA-HYDROPHOBIC COATINGS FOR OPTICAL APPLICATIONS" Proc. Europ. Coat. Conf. Smart Coatings 2002, 181.
 
• K.K. Banger, S.C. Ngo, S. Higashiya, R.U. Claessen, K.S. Bousman, P. Lim, P.J. Toscano, J.T. Welch “MOCVD precursor engineering: the preparation and characterization of sila-β-diketonate copper(II) complexes” Inorg. Chem. 2003, submitted.
 
• Banger K.K.; Ngo S.C.; Higashiya S.; Claessen R.U.; Bousman K.S.; Lim P.N.; Toscano P.J.; Welch J.T. "Facile synthesis of a novel class of organometalloid-containing ligands, the sila--diketones: preparation and physical and structural characterization of the copper(II) complexes, Cu[R'C(O)CHC(O)SiR3]2" Journal of Organometallic Chemistry, Volume 678, Number 1, 15 July 2003, pp. 15-32(18)
 
• K. Reihs, N. Malkomes, P. Müller, S. Renker, O. Stahlschmidt, R. Claessen, P. Cavaleiro, A. Duparré "Durable Ultra-Hydrophobic Glass Coatings With Optical Quality" Soc. Vac. Coat. Proc. 2003, 46, 302.
 
• Claessen R.U.; Kornilov A.M.; Banger K.K.; Ngo S.C.; Higashiya S.; Wells C.C.; Dikarev E.V.; Toscano P.J.; Welch J.T. "Investigations into the preparation of sila--diketones via 2-trimethylsilyl-1,3-dithianes: structural characterization of a second polymorph of bis(2,2,6,6-tetramethyl-2-sila-3,5-heptanedionato)copper(II) " Journal of Organometallic Chemistry, Volume 689, Number 1, 5 January 2004, pp. 71-81(11)
 

Conferences, Seminars
 
• Toscano, P. J.; Ngo, S. C.; Claessen, R.; Banger, K. K.; Welch, J. T. “Metal triflimide complexes for styrene polymerization“ 216th ACS National Meeting, Boston, August 23-27, 1998, INOR-082.
 
• T. Welch, S. C. Ngo, R. Claessen, K. K. Banger, and P. J. Toscano “Preparation and Structural Characterization of New Transition Metal Complexes Containing Triflate and Triflimide Ligands” 12th European Symposium on Fluorine Chemistry, Berlin, August 29 – September 2, 1998, C39.
 
• Toscano, Paul J.; Banger, Kulbinder K.; Kornilov, Andrei; Claessen, Rolf U.; Welch, John T.; Eisenbraun, Eric T.; Kaloyeros, Alain E. “Facile preparation and isolation of the sila- β -diketone, 2,2,6,6-tetramethyl-2-sila-3,5-heptanedione: The influence of silicon substitution on the volatility and chemical vapor Deposition properties of the Cu(II) complex.” 219th ACS National Meeting, San
Francisco, CA, March 26-30, 2000, INOR-261.
 
• Welch, John T.; Banger, Kulbinder K.; Ngo, Silvana C.; Claessen, Rolf U.; Toscano, Paul J.; Eisenbraun, Eric T.; Kaloyeros, Alain E. “Precursor engineering and characterization of new volatile copper MOCVD precursors for thin-film deposition“ 219th ACS National Meeting, San Francisco, CA, March 26-30, 2000, INOR-264.
 
• R.U Claessen et al. “The 2,2,6,6-tetramethyl-2-sila-3,5-heptanedione route to the chemical vapor deposition of copper for gigascale interconnect applications.” Mater. Res. Soc. Meeting, San Francisco, CA, April 24-28, 2000, D6.8. (presenting author)
 
• Invited Seminar: “Volatile Precursor Design for the Chemical Vapor Deposition of Metals”, Nov. 2000, Chemistry Dept. University at Albany – SUNY.
 
• R.U Claessen et al. “A new halogen-free organometallic family of precursors for CVD copper: design, characterization and process development” Applied Mechanics and Materials Summer Conference, ASME symposium, San Diego, CA, June 27-29, 2001. (presenting author)
 
• R. U. Claessen “TOWARDS A TRUE "NO-CLEAN" PROPERTY: HIGHLY DURABLE ULTRA-HYDROPHOBIC COATINGS FOR OPTICAL APPLICATIONS” European Coatings Conference - Smart Coatings, Berlin, 6.-7. June 2002.
 
• R. U. Claessen “Nanostructured and auto-regenerating hybrid inorganic/polymer coatings for a durable self-clean effect in optical quality” Mater. Res. Soc. Meeting, Boston, MA, Dec 2.-6. 2002, C6.2.
 
• R. Claessen “Durable Self Cleaning Coatings in Optical Quality” Glass Processing Days, Tampere, Finland, 15.-18. June 2003
 

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