Dr. Maximilian Kessel
Bis 2021, Scientist, Fraunhofer-Institut für Angewandte Festkörperphysik IAF
Freiburg, Deutschland
Werdegang
Berufserfahrung von Maximilian Kessel
Bis heute 3 Jahre und 3 Monate, seit Apr. 2021
Wissenschaftlicher Mitarbeiter
Carl Zeiss SMT GmbH, Oberkochen
1 Jahr und 9 Monate, Juli 2019 - März 2021
Scientist
Fraunhofer-Institut für Angewandte Festkörperphysik IAF- magnetron sputter epitaxy (MSE) of piezoelectric thin films - applying AlScN for sensing and telecommunication
1 Jahr, Jan. 2020 - Dez. 2020
acting Group Manager Piezoelectrics
Fraunhofer-Institut für Angewandte Festkörperphysik IAF- project management - material development (ferroelectric and piezoelectric AlScN, epitaxial Molybdenum) - process development (magnetron sputter epitaxy, rapid thermal annealing) - quality management
9 Monate, Okt. 2018 - Juni 2019
Postdoctoral Researcher
Institute of Physics, NTNU
- built up the laboratory for molecular beam epitaxy (MBE) - put vacuum equipment (UHV) into operation
4 Jahre und 4 Monate, März 2013 - Juni 2017
Graduate Research And Teaching Assistant
Experimental Physics 3, University of Würzburg
- molecular beam epitaxy (MBE) of HgCdTe thin films and nanowires - X-ray and electron diffraction analysis - maintenance of vacuum growth chambers (UHV) - scanning electron microscopy and electron beam lithography - fabrication of sub-micron scale electronics - operating Helium dilution refrigerators - electrical characterization of superconducting junctions - supervision of student projects - project and conference planning - teaching in condensed matter physics for undergraduate students
1 Jahr und 2 Monate, Sep. 2011 - Okt. 2012
Master student
Experimental Physics 3, University of Würzburg
- molecular beam epitaxy (MBE) of Mercury-Cadmium-Telluride thin films - maintenance of vacuum systems (UHV) - X-ray and electron diffraction - process development and material characterization
- employed as intern (03-04/2010), Bachelor student (05-07/2010) and assistant (07/2010-06/2011). - fabrication of semiconductor lasers - process development and characterization - dielectric coating by sputtering - maintenance of sputter chambers - optical characterization (FTIR)
Ausbildung von Maximilian Kessel
4 Jahre und 3 Monate, März 2013 - Mai 2017
Physics
Julius-Maximilians-Universität Würzburg
Fabrication and characterization of novel junctions combining semiconductor nanowires, topological insulators and superconductors. Thesis: “HgTe shells of CdTe nanowires: A low-dimensional topological insulator from crystal growth to quantum transport”
5 Jahre und 2 Monate, Sep. 2007 - Okt. 2012
Nanotechnology
Julius-Maximilians-Universität Würzburg
The studies covered material science, applied physics and physics of condensed matter with focus on semiconductor devices. Bachelors thesis on sputtered deposition of dielectric thin films for semiconductor lasers. Master thesis on epitaxy and characterization of crystalline II-VI thin films.
Sprachen
Englisch
Fließend
Norwegisch
Grundlagen
Deutsch
Muttersprache