Postdoctoral Fellow for EUV Nanolithography
Your tasks
- Development of EUV and beyond EUV masks or single-digit nanometer EUV interference lithography, zone plates for direct EUV writing as well as masks for EUV holography using advanced e-beam lithography and nanofabrication techniques
- Initiation and participation in experiments at the XIL-II beamline
- Participation in the commissioning and further development of the new EUV lithography tool at PSI
- User support under the NFFA project
- Close cooperation with internal and external partners
- Performing research of highest quality and publication in high impact factor journals and international conferences
Your profile
- You have a PhD degree in science or engineering and you have a keen interest in applied research in nanoscience and technology
- You have hands-on experience in nanolithography and nanofabrication
- You are looking for new challenges and you are eager to learn new methods
- You are a highly motivated team player with good communication and organization skills
- Experience in some of the following fields will be of advantage: electron beam lithography, EUV lithography, X-ray optics, nanofabrication techniques, nanocharacterization including AFM and SEM, synchrotron-based methods