Anshul Jain

• Provided solution for process parameter optimization in semiconductor fabrication using plasma physics principles, validated by feature scale simulations performed by ray tracing method. • Helped develop predictive engine based on machine learning model, trained by CD-SEM output data corresponding to Si DRIE input process parameter values.

Responsible for conducting experiments for powdered, liquid, thin film samples from IIT-Bombay, other universities and research institutes, and industries. The experiments conducted were in mid or far IR range, at room or elevated temperature

• Project: Modeling of two port 3-D surface acoustic wave (SAW) resonator for filter application. • Project: Modeling of Dolph-Tchebyshev (Dolph-Chebyshev) weights to reduce the effect of side lobe in antenna array.

Primarily worked on AlN, but have experience on III-nitrides devices. I am working on design, simulation, fabrication and characterization of acoustic wave resonators (BAW and SAW) for high frequency (GHz) application. I am acquainted with FEM and EDA simulations, PVD, photolithography, mask writing, EBL, DRIE processes and characterization processes like XRD, FTIR, SEM, AFM, PFM, reflectometry, ellipsometry, semiconductor device parameter analyzer and vector network analyzer.