Dr. Mikheil Mebonia

Fabrication and experimental study of silicon nanostructures using AFM and WLI measurement tools.

Fabrication characterization of Extreme Ultra Violet (EUV) lithography masks for Nano films

• Cleanroom fabrication of programmed defects on a Si substrate • Characterization of defect arrays using non-actinic inspection with Optical microscope (VLS), Scanning Electron Microscope (SEM), Atomic Force Microscope (AFM), White light interferometer (WLI), Focused Ion Beam Milling (FIB), Scanning Tunneling Microscope (STM), Transition Electron Microscope (TEM) • (Non)-actinic characterization of defect arrays

• Fabrication and analyse the geometrical property of Si nanostructures • Measurement electrical property using Physical Property Measurement System (PPMS) and analyse data using Origin Lab program • Simulation density of quantum state in quasi-1D layers using MATLAB programming code • Working with vacuum equipment in a cleanroom environment • Creation of experimental reports and writing scientific publication • Lecture assistant-ship, mentoring lab courses for physics students

* Planning, carrying out, measure and Analyse electrical and geometrical property of silicon nanostructures * Electrical and Thermoelectrical measurements of nano structured samples using PPMS (Physical Property Measurements System)

Measuring and mapping subsurface using geophysical methods: vertical electrical sounding and electrical resistance survey, analyzing data in WinSism software

Dissertation Topic: "Experimental studies of the propagation of programmed buried defects into multi-layer coatings"

Dissertation Topic: "Electronic property of Nanostructured Layers"

Guest PhD student.

Thesis: "Ground State Phase Diagrams of few-leg electron ladders with the structure of graphene ribbons"