Samira Binte Kazemi

- Developing dry etching process for : Silicon, (Al, In) GaN, InP, SiO2, SiNx - Develop new dry etching process based on customer request - Characterization with SEM, AFM, Profilometer, Ellipsometer, XRD - The start-up and commissioning of the ICP equipments in the Lafayette Institution's clean room - Preparing manual of procedures for the start-up, safety and use of equipment - Preparation of Reports

Masters Thesis on "Metal assisted plasma etching of Silicon" - Dry etching of silicon using hydrogen plasma - Optical Lithography - Characterization using SEM, AFM, Profilometer

Semiconductor Processing