Konstantin Mogilevsky
Werdegang
Berufserfahrung von Konstantin Mogilevsky
- Current 9 years and 4 months, since Feb 2017
TD BAW Staff Engineer
RF360 Europe GmbH - A Qualcomm TDK Joint Venture
R&D and TD in bulk acoustic wave (BAW) division of RF360jv. Implementation and industrialization of chemical mechanical polish (CMP) process. Development and improvement of further technology. Research and development of new CMP processes.
Process Development, Process Transfer, Large Volume Manufacturing of ICs, Cu CMP, Backend Integration. Development activities focused in the area of interconnects including etching, cleaning, metal deposition and chemical mechanical polishing. Metrology associated with the above processes.
- 3 years and 7 months, Apr 2008 - Oct 2011
Process Engineer
Intel Corporation
Process engineer (Chemical Mechanical Polish Group) - Micron Fab12 (Ex-Intel Fab18), Kiryat-Gat. 1. Line maintenance management: stability of process and equipment, product quality, work specifications, validation and upgrading tools configuration, failure analysis, real-time support. 2. New product introduction (NPI), new technology introduction (NTI) from R&D to production. 3. R&D projects: cost reduction, life extension of consumables, product quality, productivity and efficiency.
- 6 years and 11 months, Jun 2001 - Apr 2008
Process Technician
Intel Corporation
Process technician in Chemical Mechanical Polish: 1. Quality assurance. 2. Participate in projects of improving process and equipment characteristics in the module. 3. Troubleshooting of in-line and end of line problems caused during the process. 4. Training for process techs.
Ausbildung von Konstantin Mogilevsky
- 3 years and 3 months, Oct 2014 - Dec 2017
Organic and Molecular Electronics
Technische Universität Dresden
- 4 years and 6 months, Oct 2005 - Mar 2010
Advanced Materials
Hebrew University of Jerusalem
- 1 year and 8 months, Oct 2002 - May 2004
Electronics Engineering
Sapir Academic College
Microelectronics
Sprachen
Russian
C2 (Verhandlungssicher / Muttersprachlich)
English
C2 (Verhandlungssicher / Muttersprachlich)
German
C1 (Fließend)
Hebrew
C2 (Verhandlungssicher / Muttersprachlich)
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