Md Golam Hafiz

--Bandgap of TiO2 Atomic layer deposition (ALD) and quantizing structures -- Investigating the structural, mechanical, and optical properties of TiO2 thin film and amorphous oxides nanolaminates (to suppress crystalline growth of TiO2)

-- Design and fabrication of thin-film (by atomic layer deposition technique) in clean room condition -- Perform different characterization techniques on thin-film

--Design and fabrication of metal-dielectric thin-film (by atomic layer deposition technique) multilayer structure in clean room condition --Performed ellipsometry measurement and determined optical properties of the dielectric thin-film. Calculated Mie scattering using optical constant

Setup and application of Fabry-Perot Interferometer, Optical Time Domain Reflectometry (OTDR), Optical Gyroscope, He-Ne Laser, Nd:YAG Laser, Optical Tweezers, and Spectroscopy

--Optimization of Growth of GST thin film (using plasma enhanced deposition) on Si/Au before and after annealing --Observed the optical and electrical properties of the GST (a ternary compound of germanium, antimony, and tellurium) thin-film. In the same way, the change of optical as well as electrical properties due to reversible phase transformation between crystalline and amorphous phases

Semiconductor technology, Optoelectronics, Solid state physics, Electronic