
Ritesh Ambar
Fähigkeiten und Kenntnisse
Werdegang
Berufserfahrung von Ritesh Ambar
- Current 1 year and 4 months, since Feb 2025
Student Research Assistant
Fraunhofer ENAS
- Planning and executing experiments for spin coating and development of photoresist - Collaborating with a team to design and plan experiments for 1:1 dry etching and structure characterization using SEM and profilometry - Analyzing the effect of focus on resist roughness (post development) in an i-line grayscale mask - Investigating current challenges, contributing to the characterization of new grayscale resists and novel structures, and optimizing processes.
- Current 1 year and 4 months, since Feb 2025
Master Thesis Student
Fraunhofer ENAS
- Conducting research for the thesis titled "Process Development of Grayscale Lithography on an i-line Projection Lithography System," focusing on micro- and nanoelectronics and nanotechnology. - Engaged in comprehensive literature reviews and familiarization with previous research on grayscale lithography to support ongoing projects. - Overseeing the entire process development, which includes: Spin coating in cluster tools. Exposure and development processes.
- 7 months, Jul 2024 - Jan 2025
Student Research Assistant
Fraunhofer EMFT
Quantum Technology
- 1 year and 5 months, Feb 2023 - Jun 2024
Working Student- Test and Integration
AERQ GmbH
Ausbildung von Ritesh Ambar
- Current 3 years and 8 months, since Oct 2022
Masters in Microelectronics and Microsystems
TU Hamburg-Harburg
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